Handheld cf4 Measurement
Plasma Cleaners, Plasma Etchers, Reactive Ion Etcher, Ion Beam Sputter Reactive Ion Etcher – Model RIE 2000. The Reactive Ion Etcher (RIE) is a table-top plasma chemistry reactor designed to provide anisotropic etch plasma technology at a moderate cost.
[email protected]3.1 The hand chain manually operated chain hoists shall be model CF4 as supplied by Harrington Hoists, Inc. The hoists shall be rated ½ US Ton through 5 US Ton. 3.2 The hand chain manually operated chain hoists shall meet the design and construction criteria of paragraph 2.1 above. 3.3 The hand chain manually operated chain hoists shall employ single gear reduction spur gear transmission. 3.4 The hand chain manually operated
Get PriceCF4 5.9 mm @ 450 mm (0.23 in @ 177 in) SF 16 mm @ 1260 mm (0.63 in @ 49.6 in) System accuracy (at T amb = 23 ± 5&C [73.4 ±41 &F]): ±1 % or ±1 &C 2),3) (±1.8 &F) 2)3) (CTlaser LT) ±1.5 % or ±1.5 &C 2),3) (±2.7 &F) 2)3) (CTlaser LTF) Repeatability (at T amb = 23 ± 5&C [73.4 ±41 &F]): ±0.5 % or ±0.5 &C 2) (±0.9 &F) 2) (CTlaser LT)
Get PriceJan 01, 1993We present an integrated set of measurements, which includes the drift velocity, longitudinal single electron diffusion, characteristic electron energy, single electron pulse height spectra, operating wire gain, relative cathodic breakdowns in different gases, effect of water addition on the drift parameters, impurity problems in the CF 4-based gases, diffusion near the wire and wire aging.Cited by: 81
Get Price5 mins readOct 06, 2003The measurement starts at zero (“plano”), with four quarters to a diopter: 0.25 (a quarter diopter), 0.50 (one half a diopter), 0.75 (3/4 of a diopter), and 1.00 (one diopter). The higher the numbers, the higher (stronger) the prescription.
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Get PriceJun 11, 2011From the measurement above we decided to carry out the subsequent performance tests with the prototype TPC using a mixture of Ar–CF 4 (3%)–isobutane (2%), with V GEM =240 V and the transfer and the induction fields of 1.6 kV/cm, resulting in an effective gas gain of
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Get PriceThe WIKA SF 6-Purity Meter is a cost effective way to determine if the SF 6 percentage in SF 6-filled equipment meets the requirements.Tolerable limits are suggested by the cigré SF 6-Recycling Guide and the IEC 60480 for used gas. Measuring the SF 6-concentration the SF 6-Purity-Meter indirectly measures impurities of the tested SF 6-gas like air and CF4.
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Get PriceFluorine gases, such as CF4 or C2F6 and mixtures thereof, added to the ashing plasma are known to aid in the photoresist and polymer removal from post etch via and metal applications. Reactive species derived from the fluorine containing gas mixtures are generated in the plasma and these species diffuse or are directed to the substrate.
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Get PriceThe NMR 19 F spin-lattice relaxation time constant T 1 for CF 4 gas is dominated by spin–rotation interaction, which is mediated by the molecular collision frequency. When confined to pores of approximately the same size or smaller than the bulk gas mean free path, additional collisions of molecules with the pore walls should substantially change T 1.To develop a method for measuring
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