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develop cf4 Measurement

PROJECT UPDATE: MEASUREMENT VERIFICATION (MV) PLAN REVIEW FOR SEMICONDUCTOR FAB # TEMBUSUAsiaConsulting has been engaged for a review and endorsement of the Measurement Verification (MV) Plan prepared as part of the non-CO2 emissions (CHF3, CF4, NF3) abatement project for a leading semiconductor fab based in Singapore.

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  • Protocol for Measurement of Tetrafluoromethane (CF4)

    comments on the protocol throughout the protocol’s development. In particular, the authors appreciated the comments provided by Neal Dando, of Alcoa, Inc., Halvor Kvande of Hydro Aluminium, and Jean-Nicolas Maltias of Rio Tinto Alcan. Their comments based on their direct experience with PFC measurements improved the protocol.

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  • Protocol for Measurement of CF4 and C2F6 from Primary

    Protocol for Measurement of CF4 and C2F6 from Primary Aluminum Production. This document describes a measurement protocol to assist with developing accurate PFC inventories based on the Intergovernmental Panel on Climate Change (IPCC) Tier 3b method. You may need a PDF reader to view some of the files on this page.

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  • Protocol for Measurement of Tetrafluoromethane and

    The procedure described here provides a method for making accurate measurements of CF4 and C2F6 emissions and relating those measurements to anode effect process data. Development of modern

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  • Refractive index of carbon tetrafluoride (CF4) in the 300

    Jul 15, 1990Conclusion From the liquid-CF4 measurement the Abbe number for 144, 150 and 155.6 nm was expected to be around 85, versus 53 for helium. The present results show that it should be rather taken as 31. It should therefore be considered that helium is still the best gas to be used as a radiator in Cherenkov detectors and that in many cases achromatisation devices cannot be avoided.Cited by: 22

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  • CiteSeerX — PROTOCOL FOR MEASUREMENT OF

    Two perfluorinated compounds (PFCs), tetrafluoromethane (CF4) and hexafluoroethane (C2F6), are produced periodically during primary aluminum production by the Hall-Héroult process. The measurement of PFCs is required to assist with developing the most accurate greenhouse gas emissions inventories.

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  • Tetrafluoromethane - NIST

    Formula: CF 4. Molecular weight: 88.0043. IUPAC Standard InChI: InChI=1S/CF4/c2-1 (3,4)5. Download the identifier in a file. IUPAC Standard InChIKey: TXEYQDLBPFQVAA-UHFFFAOYSA-N. CAS Registry Number: 75-73-0. Chemical structure: This structure is also available as

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  • Ion-molecule reactions and ion energies in a CF4 discharge

    with CF4, collision-induced dissociation for CF: colliding with CF4, and collisional electron detachment for F- collid-ing with CF4 Cross sections have been determined for rela-tive collision energies ranging from 20 to about 400 eV for F+ and CF: and from 2 to 80 eV for F-. In the second portion of this paper we present measure-

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  • PAPER OPEN ACCESS

    measurement data of absorption spectrum and spectrum line changing with temperature and pressure, the mixture algorithm of RBF neural network and NSGA-II is used to invert the concentration of CF4 gas[9,10]. Hardware and device development: develop a set

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  • Jerry MARKS | Sr Consultant | PhD

    Two perfluorinated compounds (PFCs), tetrafluoromethane (CF4) and hexafluoroethane (C2F6), are produced periodically during primary aluminum production by the

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  • Infrared pyrometer with laser sighting for demanding

    Infrared sensor of the thermoMETER CTLaser series are used for precise, industrial measurements. From extremely low temperatures (-50&C) to the highest temperatures (3000&C), these IR sensors measure precisely and reliably.

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  • Development of Fluorine Plasma Treatment for

    Methodology: Design of experiments. ICP power: 1000W CF4 flow rate: 80 sccm Pressure: 10 mTorr Bias power: 10 W Treatment time: vary. Pre-run XPS. 300W variable 100 sec variable 150 sccm 0 Min: 400W Max: 3500W Max: 100 sccm Typical 10 mTorr Reliable Min: 5-10 W 400 -1000W Similar uniformity 20-80 sccm similar oxide etch rate Higher ICP power deeper F Longer time Higher surface

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  • APPENDIX F: ACOUSTIC WAVE DEVICES FOR CHEMICAL

    Measurements of these changes can be used to indicate the identity and concentration of a specific chemical species in the environment. By using coatings with selective absorption properties, investigators are developing sensors that can detect specific chemical species for both gas-phase and liquid-phase environments (Kepley et al., 1987).

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  • Tiger Optics: Cavity Ring-Down Spectroscopy Trace Gas

    GASES CHEMICALS Trace Moisture Measurement over Wide Range of Sample Pressure—Now Down to 0 psig. The popular Spark H 2 O for industrial gas applications now features new models that operate at lower sample pressures (less than 10 psig). From Air Separation Units (ASUs) to low-pressure moisture generators, in some applications it is difficult to continuously sustain high sample pressure.

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  • Developing a Reliable Fluorinated Greenhouse Gas (F-GHG

    These data were used to calculate the scrubber DRE for CF4 using the following equation: DRE = 1 - ((CF4outX Dilution)/CF4in) (4) Here CF4out and CF4;n represent the average CF4 concentrations determined for each flow shown in Figure 6.

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  • Tetrafluoromethane Enthalpy of Formation

    C (graphite) + 2 F2 (g) → CF4 (g) Δ r H&(298.15 K) = -223.024 ± 0.157 kcal/mol: 5.6: CF4 (g) + 2 H2 (g) → CH4 (g) + 2 F2 (g) Δ r H&(0 K) = 205.73 ± 0.25 kcal/mol: 5.6: CF4 (g) + 2 H2 (g) → CH4 (g) + 2 F2 (g) Δ r H&(0 K) = 205.54 ± 0.25 kcal/mol: 5.6: CF4 (g) + 2 H2 (g) → CH4 (g) + 2 F2 (g) Δ r H&(0 K) = 205.80 ± 0.25 kcal/mol: 2.8

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  • Understanding Per‐and Polyfluoroalkyl Substances

    Aug 04, 2020•Platform for measurement methods development (e.g., •CF4 in particular has a very strong C‐F bond which would give confidence in the thermal destruction of C‐F bonds in PFAS (note CF4 is used as refrigerant and is a GHG)

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  • Infrared thermometers pyrometers from Optris

    Infrared thermometers pyrometers. Optris infrared thermometers and pyrometers for spot measurements are particularly well suited for precise temperature monitoring of industrial manufacturing processes, research and development, and function checks of a diverse range of devices and systems. Simply select a suitable temperature sensor from one of the following product groups!

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  • Social and economic measures of development - Contrasts in

    Other measures of development HDI is the best measure of development as it takes into account both economic and social factors. However there are many other measures of development that can be used.

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  • Tetrafluoromethane - NIST

    Notice: Except where noted, spectra from this collection were measured on dispersive instruments, often in carefully selected solvents, and hence may differ in detail from measurements on FTIR instruments or in other chemical environments. More information on the manner in which spectra in this collection were collected can be found here. Notice: Concentration information is not available for

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  • Understanding Blood Pressure Readings | American Heart

    Use our blood pressure chart to learn what your blood pressure numbers mean. Systolic, diastolic? The American Heart Association helps you understand the various levels of blood pressure and how high blood pressure or hypertension is defined. Also learn about prehypertension, hypertension, hypertensive crisis, and what is a healthy blood pressure.Cooking to Lower Cholesterol | American Heart AssociationNov 10, 2020What Your Cholesterol Levels Mean | American Heart AssociationNov 05, 2020What is Diabetes? | American Heart AssociationJan 12, 2020High Blood Pressure | American Heart Association See more results

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  • CF4 plasma-fluorinated nano-SiC promotes the charge

    Surface potential measurement and volume conductivity measurement are performed to evaluate charge transfer in the nanocomposites. When the concentration of fluorinated nano-SiC is 5 wt.%, the surface decay rate of the sample is larger than that of samples doped with less nanofiller, and the initial surface charge density is 79.8% that of the

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  • Electron Interactions With Plasma Processing Gases: An

    static electric-dipole polarizability of CF4 equal to 28.42 X 10-25 cm3 and 28.24X 10-25 cm3 (see also Ref. 8 for a recent calculation of the static and dynamic polarizabilities

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  • Draw-wire displacement sensors | Micro-Epsilon

    Draw-wire sensors of the wireSENSOR series measure with high linearity across the entire measuring range and are used for distance and position measurements of 50mm up to 50,000mm. Draw-wire sensors from Micro-Epsilon are ideal for integration and subsequent assembly in serial OEM applications, e.g., in medical devices, lifts, conveyors and

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  • A model-based technique for real-time estimation of

    tain a relative measurement of the active species.13,18,19,24 Dalvie and Jensen,6 however, found that, with 1% argon mixed with their CF4 feed gas, the tracer was diluted by as much as 25%. This sort of dilution induces errors in the interpretation of actinometry as a species concentration measurement.19,24 Jenq and coworkers12 proposed a combi-

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  • Technical Support Document for Process Emissions from

    Specifically, the Protocol recommends that operators repeat measurements of slope coefficients for CF4 and C2F6 if one or more of the following apply: 1. Thirty-six months have passed since the last measurements (i.e. triennial measurements are recommended); 2.

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  • Masimo Semiconductor Facilities

    Masimo Semiconductor operates MOCVD (Metal Organic Chemical Vapor Deposition) epitaxial reactors in multiple shifts, providing ample capacity for development and production of 50mm, 75mm, and 100mm GaAs and InP based epitaxial wafers.

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  • NIST AuiDs iMisr ^^^^H Commerce

    ;NIST AuiDs3S5t5p^^^^H PUBLICATJONS UnitedStstesDepartmentofCommerce TechnologyAdministration iMisr NationalInstituteofStandardsandTechnology NISTTechnicalNote1425

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  • TEMBUSU Asia - Home | Facebook

    PROJECT UPDATE: MEASUREMENT VERIFICATION (MV) PLAN REVIEW FOR SEMICONDUCTOR FAB # TEMBUSUAsiaConsulting has been engaged for a review and endorsement of the Measurement Verification (MV) Plan prepared as part of the non-CO2 emissions (CHF3, CF4, NF3) abatement project for a leading semiconductor fab based in Singapore.

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